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EUV Pellicle
EUV Pellicle (Extreme Ultraviolet Pellicle) refers to a nano-scale thin film that protects the surface of the photomask from molecules or contamination in the atmosphere.

Data : Industrial Data, Meritz Securities Research Center

  • EUV Process

    The EUV process is a photo process, which is an important process in making semiconductors, and lithography, which uses a light source with extreme ultraviolet wavelengths, is also a manufacturing process that utilizes this.

  • EUV Process Benefits

    Since the ultraviolet wavelength is less than one-tenth of the length of the wavelength of the argon fluoride(ArF) light source in the existing process, exposure can produce semiconductor circuit patterns in more detail and reduce the number of processes to improve productivity and performance.

About Pellicle
It refers to a nano-scale thin film that protects the surface of the photomask from molecules or pollution in the atmosphere.

Data : Industrial Data, Meritz Securities Research Center

Pellicle Use Effect

The use of pellicles reduces the defect rate and reduces the cleaning cycle of the photomask because it protects the photomask from molecules or pollution in the atmosphere. Accordingly, the lifespan of the photomask also increases. As the life of an expensive photomask increase, there is an advantage in that the cost may also be saved.

EUV Pellicle Market Outlook

  • EUV Pellicle Market Outlook

    Data : Industrial Data, Meritz Securities Research Center

  • Number of masks and pellicles required for EUV application

    Data : Industrial Data, Meritz Securities Research Center